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FABRICATION METHOD OF BAND-GAP ADJUSTABLE ZNO FILM AND THEIR APPLICATION FOR SOLAR CELLS

机译:带隙可调节ZNO薄膜的制备方法及其在太阳能电池中的应用

摘要

The present invention relates to a method of fabricating an N-doped ZnO film of adjusting band gap and the application for solar cells using the same. More particularly, the present invention relates to a method of fabricating a solar cell which includes a step of depositing N-doped ZnO by forming argon/nitrogen mixture gas plasma in a ZnO target; a step of controlling band gap by controlling the thickness of the N-doped ZnO thin film; and a step of depositing a N-doped CuO thin film in the upper part of the N-doped ZnO thin film. Because a ZnO film of adjusting band gap of the present invention has a function of light absorption in a wide range and the control of band gap according to thickness, it is used as a light emitting material. Also, because a solar cell which includes the N-doped ZnO thin film of the present invention provides high power conversion efficiency, it can be used as an optical device such as a solar cell, LED, etc, and a semiconductor application material.
机译:本发明涉及一种制造可调节带隙的N掺杂ZnO膜的方法及其在太阳能电池中的应用。更具体地,本发明涉及一种制造太阳能电池的方法,该方法包括以下步骤:通过在ZnO靶中形成氩/氮混合气体等离子体来沉积N掺杂的ZnO。通过控制N掺杂ZnO薄膜的厚度来控制带隙的步骤;在所述N掺杂ZnO薄膜的上部沉积N掺杂CuO薄膜的步骤。由于本发明的调节带隙的ZnO膜具有宽范围的光吸收功能以及根据厚度控制带隙的功能,因此其被用作发光材料。而且,因为包括本发明的N掺杂的ZnO薄膜的太阳能电池提供高的功率转换效率,所以其可以用作诸如太阳能电池,LED等的光学器件以及半导体应用材料。

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