A method of forming a micro-surface structure as well as for producing a microelectromechanical component, micro-surface structure as well as mems component with such a structure

摘要

A method of forming a micro-surface structure (1) on a substrate (202), in particular for the production of a micro component,in which at the substrate (202) has a first fine structure (2) with at least one first elevation (200) and / or recess, in particular with numerous first elevations (200) and / or depressions, is formed by anisotropic dry etching,the first (n) elevation (s) (200) and / or a depression (s) with a functional material (220) has or have a surface to be coated, which extends perpendicularly or obliquely with respect to a substrate plane (204),the with the functional material (220) to be coated surface of the first fine structure (2) are at least in part second wave or convex elevations (210, 207) and / or recesses (210, 206), which are produced by the fact that the first fine structure (2) is formed by the anisotropic dry etching, and which serve as nucleation points, on which the functional material (220) is preferably,wherein the functional material (220) at such an angle of incidence α to the substrate plane (204) is deposited, that the second wave or boss-like elevations (210, 207) and / or recesses (210, 206) bring about a shading effect, as a result of growth sites of the functional material (220) only on the raised form substrate, so that the functional material (220) in the form of a second fine structure (3) with the surface to be coated, which solids, preferably in the form of lamellae and / or rods, is applied.