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Device for processing workpieces in vacuum process chamber for inline processes under vacuum, comprises multi-part vacuum processing chamber, which has fixed open framework and is vacuum-tightly closed by closure element on one side
Device for processing workpieces in vacuum process chamber for inline processes under vacuum, comprises multi-part vacuum processing chamber, which has fixed open framework and is vacuum-tightly closed by closure element on one side
Device comprises a multi-part vacuum processing chamber, which has a fixed open framework (1) formed from side walls, and is vacuum-tightly closed by a closure element on one side and is closed by a horizontally movable slide plate (14) on the other side.
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