首页> 外国专利> Sputtering magnetron e.g. tubular magnetron for PVD coating of substrate, has actuator which is provided with screw mechanism having threaded spindle whose axis of rotation is made perpendicularly to rotation axis of tubular target

Sputtering magnetron e.g. tubular magnetron for PVD coating of substrate, has actuator which is provided with screw mechanism having threaded spindle whose axis of rotation is made perpendicularly to rotation axis of tubular target

机译:溅射磁控管用于衬底的PVD涂层的管状磁控管,具有致动器,该致动器具有带丝杠的螺杆机构,丝杠的旋转轴垂直于管状靶的旋转轴

摘要

The magnetron has tubular target and magnet system that are moved relative to each other. The magnetic field penetrating target is formed by magnet system. The magnet system is comprised with a carrier device, a magnet assembly (2) and actuating component. A support device is connected to the magnet assembly. The distance between the magnet system and target is partly adjustable through an actuator (10). The actuator is provided with screw mechanism having threaded spindle (8). The axis of rotation of spindle is made perpendicularly to rotation axis of target.
机译:磁控管具有彼此相对运动的管状靶和磁体系统。磁场穿透靶由磁体系统形成。磁体系统包括承载装置,磁体组件(2)和致动部件。支撑装置连接到磁体组件。磁铁系统和目标之间的距离可通过执行器(10)进行部分调节。致动器设有带有螺纹主轴(8)的螺杆机构。主轴的旋转轴垂直于目标的旋转轴。

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