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Sputtering magnetron e.g. tubular magnetron for PVD coating of substrate, has actuator which is provided with screw mechanism having threaded spindle whose axis of rotation is made perpendicularly to rotation axis of tubular target
Sputtering magnetron e.g. tubular magnetron for PVD coating of substrate, has actuator which is provided with screw mechanism having threaded spindle whose axis of rotation is made perpendicularly to rotation axis of tubular target
The magnetron has tubular target and magnet system that are moved relative to each other. The magnetic field penetrating target is formed by magnet system. The magnet system is comprised with a carrier device, a magnet assembly (2) and actuating component. A support device is connected to the magnet assembly. The distance between the magnet system and target is partly adjustable through an actuator (10). The actuator is provided with screw mechanism having threaded spindle (8). The axis of rotation of spindle is made perpendicularly to rotation axis of target.
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