Transfer mask for structured vapor deposition of substrates, comprises transparent intermediate support, on rear face of which stack of layers having absorber layer of radiation-absorbing material, is arranged and continuous cover layer

摘要

Transfer mask (1) for structured vapor deposition of substrates, comprises a transparent intermediate support (2), on the rear face of which a stack of layers having an absorber layer (6) of a radiation-absorbing material, is arranged and a continuous cover layer (10) is arranged on top of support. A continuous evaporation layer (12) of the material to be evaporated is arranged on top of the cover layer. The evaporation layer can be evaporated only in sections in evaporation fields, in which the layer stack of the transfer mask comprises many spacers of the same height. Transfer mask (1) for structured vapor deposition of substrates, comprises a transparent intermediate support (2), on the rear face of which a stack of layers having an absorber layer (6) of a radiation-absorbing material, is arranged and a continuous cover layer (10) is arranged on top of support. A continuous evaporation layer (12) of the material to be evaporated is arranged on top of the cover layer. The evaporation layer can be evaporated only in sections in evaporation fields, in which the layer stack of the transfer mask comprises many spacers of the same height for adjusting a distance between the evaporation layers to a substrate to be coated in those evaporation-free regions of the evaporation layer, from which no vapor deposition of the substrate is performed. The spacers are formed in the absorber layer of the radiation-absorbing material, or a spacer layer or an intermediate layer within the layer stack. Independent claims are also included for: (1) producing a transfer mask, comprising depositing the individual layers of the layer stack one above the other and optionally structuring by subtractive process on a transparent intermediate support for the respective layer; (2) vapor deposition for locally differentiable evaporation of substrates by a transfer mask, comprising partially vaporizing at least one absorber layer and continuous evaporation of the material to be vaporized, where the evaporation material is vaporized locally by energy input into the absorber layer by radiation corresponding to the deposited structures and reflected locally on a transfer mask opposite substrate; and (3) an evaporating apparatus for locally differentiable evaporation of substrates with a transfer mask, comprising at least one absorber layer and a transparent intermediate support with which evaporation layer is only partially vaporized, a radiation source for energy input into the transfer mask by radiation and a holding device for holding the mask and transferring at least one of the substrate opposite to each other, and transfer mask, where at least one holding device has translation means for the translatory adjustment of the target-substrate distance.