Projection exposure system e.g. extreme UV projection exposure system for microlithography, has optical element bearings that are provided with bipod on which temperature sensor and temperature-regulating element are arranged

摘要

The exposure system has several optical elements that are provided with an optical elements bearing having one bipod (3) on which a temperature sensor (6) and a temperature-regulating element (5) are arranged. The temperature-regulating element is a heating and cooling element such as resistance heating element. The bipod is formed from a metallic material. An independent claim is included for method of operating projection exposure system.