Support for mirror of extreme UV-projection exposure system used in microlithography process to produce small structure in e.g. nanometer range, has actuators associated to bipod holder, mirror connection and support elements as compensator

摘要

The support has a bipod holder (2), a mirror connection (6), and support elements (2', 6') for fixedly connecting a mirror (7) with a holder or a housing part (1). Actuators (5, 5') e.g. piezo elements, are associated to the bipod holder, the mirror connection and the support elements as a compensator. The actuators are designed so that an actuating possibility of the actuators is adjusted relative to a type and/or a magnitude of one or multi dimensional position change of position deviations to be expected due to temperature fluctuations, aging phenomena and/or assembly inaccuracies. Independent claims are also included for the following: (1) a projection exposure system (2) a method for operating a projection exposure system.