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Optical system for e.g. extreme ultraviolet lithography system for manufacture of integrated circuit, has control device supplying or discharging heat from optical element to hold/control deformation of element during exposure of surface
Optical system for e.g. extreme ultraviolet lithography system for manufacture of integrated circuit, has control device supplying or discharging heat from optical element to hold/control deformation of element during exposure of surface
The system (200) has an optical element (124) including an optical surface (214). A temperature control device supplies heat to the optical element or discharges the heat from the optical element to hold or control deformation of the optical element during exposure of the optical surface. The temperature control device includes a moderate temperature element, which is spaced apart from a side surface (216) of the optical element. The optical element includes titanium-endowed, quartz glasses, one, in particular started and inoculated, glass ceramic, copper, aluminum, silicon or calcium chloride.
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