首页> 外国专利> Optical system for e.g. extreme ultraviolet lithography system for manufacture of integrated circuit, has control device supplying or discharging heat from optical element to hold/control deformation of element during exposure of surface

Optical system for e.g. extreme ultraviolet lithography system for manufacture of integrated circuit, has control device supplying or discharging heat from optical element to hold/control deformation of element during exposure of surface

机译:光学系统,例如用于制造集成电路的极紫外光刻系统,具有控制装置,该控制装置从光学元件提供热量或从热量释放热量,以在表面暴露期间保持/控制元件的变形

摘要

The system (200) has an optical element (124) including an optical surface (214). A temperature control device supplies heat to the optical element or discharges the heat from the optical element to hold or control deformation of the optical element during exposure of the optical surface. The temperature control device includes a moderate temperature element, which is spaced apart from a side surface (216) of the optical element. The optical element includes titanium-endowed, quartz glasses, one, in particular started and inoculated, glass ceramic, copper, aluminum, silicon or calcium chloride.
机译:系统(200)具有包括光学表面(214)的光学元件(124)。温度控制装置向光学元件提供热量或从光学元件释放热量,以在光学表面暴露期间保持或控制光学元件的变形。温度控制装置包括适度的温度元件,该温度元件与光学元件的侧表面(216)间隔开。光学元件包括赋有钛的石英玻璃,特别是已开始和接种的石英玻璃,玻璃陶瓷,铜,铝,硅或氯化钙。

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