首页> 外国专利> PHOTOCATALYST SEMICONDUCTOR ELEMENT, PHOTOCATALYTIC OXIDATION-REDUCTION REACTOR, AND METHOD FOR PERFORMING PHOTOELECTROCHEMICAL REACTION

PHOTOCATALYST SEMICONDUCTOR ELEMENT, PHOTOCATALYTIC OXIDATION-REDUCTION REACTOR, AND METHOD FOR PERFORMING PHOTOELECTROCHEMICAL REACTION

机译:光催化剂半导电元素,光催化氧化还原反应器以及进行光化学反应的方法

摘要

PROBLEM TO BE SOLVED: To provide a photocatalyst semiconductor element which has durability against etching and, further, enables an oxidation-reduction reaction to occur by light irradiation with higher energy conversion efficiency, and to provide a photocatalytic oxidation-reduction reactor and a method for performing a photoelectrochemical reaction using the reactor.SOLUTION: There is provided a photocatalyst semiconductor element for a photocatalytic oxidation-reduction reaction, comprising: a light absorption layer comprising GaN and/or InGaN laminated on a substrate via a carrier mobile layer comprising n-type GaN; and a cocatalyst comprising CuO supported on a surface of the light absorption layer. In the photocatalyst semiconductor element, when the light absorption layer comprises InGaN, a rate of coverage of the light absorption layer surface by the cocatalyst comprising CuO is preferably 0.7 to 4 area%. When the light absorption layer comprises GaN, the rate of coverage of the light absorption layer surface by the cocatalyst comprising CuO is preferably 0.4 to 2 area%.
机译:解决的问题:提供一种具有耐蚀刻性的光催化剂半导体元件,并且还能够以更高的能量转换效率通过光照射发生氧化还原反应,并且提供一种光催化氧化还原反应器和方法。解决方案:提供一种用于光催化氧化还原反应的光催化剂半导体元件,包括:包含GaN和/或InGaN的光吸收层,经由包含n型的载流子移动层层压在基板上氮化镓;包含负载在光吸收层的表面上的CuO的助催化剂。在光催化剂半导体元件中,当光吸收层包含InGaN时,包含CuO的助催化剂对光吸收层表面的覆盖率优选为0.7〜4面积%。当光吸收层包含GaN时,包含CuO的助催化剂对光吸收层表面的覆盖率优选为0.4至2面积%。

著录项

  • 公开/公告号JP2015147190A

    专利类型

  • 公开/公告日2015-08-20

    原文格式PDF

  • 申请/专利权人 TOKYO UNIV OF SCIENCE;

    申请/专利号JP20140022128

  • 发明设计人 OKAWA KAZUHIRO;OHARA WATARU;

    申请日2014-02-07

  • 分类号B01J35/02;C01B3/04;B01J27/24;

  • 国家 JP

  • 入库时间 2022-08-21 15:35:37

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