首页> 外国专利> METHOD FOR EVALUATING CRYSTAL GRAIN SIZE DISTRIBUTION OF POLYCRYSTALLINE SILICON, METHOD FOR SELECTING POLYCRYSTALLINE SILICON ROD, POLYCRYSTALLINE SILICON ROD, POLYCRYSTALLINE SILICON MASS, AND METHOD FOR PRODUCING SINGLE CRYSTALLINE SILICON

METHOD FOR EVALUATING CRYSTAL GRAIN SIZE DISTRIBUTION OF POLYCRYSTALLINE SILICON, METHOD FOR SELECTING POLYCRYSTALLINE SILICON ROD, POLYCRYSTALLINE SILICON ROD, POLYCRYSTALLINE SILICON MASS, AND METHOD FOR PRODUCING SINGLE CRYSTALLINE SILICON

机译:多晶硅晶体粒度分布的评估方法,多晶硅棒的选择方法,多晶硅棒,多晶硅质量的制备方法和单晶硅的制备方法

摘要

PROBLEM TO BE SOLVED: To provide a technique which contributes to such a case that polycrystalline silicon suitable as a raw material for producing single crystalline silicon is selected with high quantitative property and reproducibility and the single crystalline silicon is produced stably.SOLUTION: When a crystal grain size distribution of the polycrystalline silicon is evaluated, a collected disk-shaped sample 20 is disposed at such a position that Bragg reflection from the Miller index plane (hkl) is detected; the disk-shaped sample 20 is rotated in-plane around the center thereof at a rotation angle so that an X-ray irradiation range, which is defined by a slit, scans the principal plane of the disk-shaped sample 20; a chart showing the rotation angle () dependency of the disk-shaped sample 20 of the Bragg reflection intensity is obtained; a change amount of the diffraction intensity of a baseline of the scan/chart, which intensity is changed per a unit rotation angle, is calculated as a primary differential value; the distortion degree is calculated when a normal distribution curve of the absolute values of the change amounts is formed; and the polycrystalline silicon suitable as the raw material for producing the single crystalline silicon is selected by using the calculated distortion degree as an evaluation index of the crystal grain size distribution.
机译:解决的问题:提供一种有助于以下情况的技术:选择适合用作生产单晶硅的原料的多晶硅,其定量性能和可重复性高,并且稳定地生产单晶硅。评价多晶硅的粒径分布,将收集到的圆盘状的样品20配置在检测出来自米勒折射率面(hkl)的布拉格反射的位置。圆盘状样品20以其中心围绕平面以旋转角度旋转,从而由狭缝限定的X射线照射范围扫描圆盘状样品20的主平面。得到表示布拉格状反射强度的圆板状试样20的旋转角()依赖性的图。计算每单位旋转角度改变的扫描/图的基线的衍射强度的改变量作为一次微分值;当形成变化量的绝对值的正态分布曲线时,计算变形度;通过使用计算出的变形度作为晶粒尺寸分布的评价指标,选择适合作为单晶硅的制造原料的多晶硅。

著录项

  • 公开/公告号JP2015009996A

    专利类型

  • 公开/公告日2015-01-19

    原文格式PDF

  • 申请/专利权人 SHIN ETSU CHEM CO LTD;

    申请/专利号JP20130134123

  • 发明设计人 MIYAO SHUICHI;NETSU SHIGEYOSHI;

    申请日2013-06-26

  • 分类号C01B33/02;C30B29/06;

  • 国家 JP

  • 入库时间 2022-08-21 15:33:27

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