method for depositing a metal film having an oxygen deficiency

摘要

The The default of oxygen-deficient metal film having an oxygen deficiency, by a chemical reaction of at least one of the precursor, method of depositing on a substrate is described. Typical methods for metal oxide deposition cycle, and exposing the substrate to an oxygen reactive gas containing a metal reactive gas and an oxygen containing metal, a layer containing a metal oxide to form on a substrate, the oxygen deficiency During the deposition cycle, and exposing the substrate to the additional reaction gas containing no metal reaction gas and the oxygen containing metal, during the second cycle, at least one second and a layer of metal nitride, and mixed metal was formed on the substrate, the second layer, that in comparison with the layer containing the metal oxide which is deficient of oxygen, as well as repeated metal oxide deposition cycle and oxygen deficiency deposition cycles, default oxygen to form an oxygen-deficient film having a defect, and a.BACKGROUND 1