gas processing method, gas processing unit, forming method and the fine powder forming apparatus of fine powder

摘要

PROBLEM TO BE SOLVED: To remove a hydride of silicon from gas containing the hydride of silicon in a simpler manner than conventional ones while suppressing increase in costs.;SOLUTION: A gas treatment method removes the hydride of silicon from gas containing the hydride of silicon. The gas treatment method is adopted, which is characterized in that bubbles having a diameter of 10 μm or less and comprising the gas containing the hydride of silicon are brought into contact with water.;COPYRIGHT: (C)2013,JPO&INPIT