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Spatial light modulation element manufacturing method, spatial light modulation element, spatial light modulator, and exposure apparatus

机译:空间光调制元件的制造方法,空间光调制元件,空间光调制器以及曝光装置

摘要

Provided is a spatial light modulation element comprising a substrate; a flat portion that is movable relative to the substrate; a flat board attached to the flat portion; and a dielectric film that is formed on a surface of the flat board opposite the surface on which the flat portion is attached, and reflects incident light. In the spatial light modulation element the dielectric film may include two or more types of dielectric layers that are repeatedly layered in an alternating manner, such that adjacent layers have different refractive indexes from each other. Furthermore, the dielectric film may be formed by alternately layering an Al2O3 film and a SiO2 film.
机译:本发明提供一种空间光调制元件,其包括基板。相对于基板可移动的平坦部分;附接到平坦部分的平板;电介质膜形成在平板的与安装有平坦部的表面相反的表面上,并且反射入射光。在空间光调制元件中,电介质膜可以包括以交替方式重复层叠的两种或更多种类型的电介质层,使得相邻层具有彼此不同的折射率。此外,可以通过交替地层叠Al 2 O 3膜和SiO 2膜来形成介电膜。

著录项

  • 公开/公告号JP5751332B2

    专利类型

  • 公开/公告日2015-07-22

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20130529877

  • 发明设计人 鈴木 美彦;鈴木 純児;小西 浩;

    申请日2012-08-22

  • 分类号G02B26/08;B81C1;B81C3;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 15:31:17

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