首页> 外国专利> crystallization index acquisition device and the crystallization index acquisition method

crystallization index acquisition device and the crystallization index acquisition method

机译:结晶指数获取装置及结晶指数获取方法

摘要

PROBLEM TO BE SOLVED: To easily and accurately acquire a crystallization index indicating a degree of crystallization in a microcrystal silicon film.;SOLUTION: In a crystallization index acquisition apparatus 1, a theoretical dielectric function of a microcrystal silicon film is represented as a combination of a plurality of partial dielectric function models and a crystallization index κ indicating a degree of crystallization in the microcrystal silicon film is set based on an amplitude of a high energy peak model contributed to a peak at a high energy side of an imaginary part in the dielectric function of a crystal silicon film among the plurality of partial dielectric function models. Then, each of parameters in a parameter group included in the plurality of partial dielectric function models is represented by the crystallization index κ, the value of each of parameters is changed by changing the crystallization index κ, and fitting of the theoretical dielectric function to a measured dielectric function acquired by a spectroscopic ellipsometer 3 is performed. Thus, the crystallization index κ of the microcrystal silicon film can be determined easily and accurately.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:为了容易且准确地获得表示微晶硅膜中的结晶度的结晶指数。解决方案:在晶化指数获取装置1中,微晶硅膜的理论介电函数表示为多个部分介电函数模型和结晶指数κ在多个部分电介质中,根据对结晶硅膜的介电函数的虚部的高能侧的峰有贡献的高能量峰模型的振幅,来设定表示微晶硅膜的结晶度的值。功能模型。然后,多个部分介电函数模型中包括的参数组中的每个参数由结晶指数&kappa表示​​;每个参数的值通过改变结晶指数κ和理论介电函数的拟合而改变。对由光谱椭偏仪3获取的测得的介电函数进行求和。因此,结晶指数κ。可以轻松,准确地确定微晶硅膜的厚度。;版权所有:(C)2012,日本特许厅&INPIT

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号