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palladium catalyst application solution comprising palladium ammine complex salt aqueous solution and electroless nickel plating of the copper wiring board using the same how

机译:包含钯胺络合物盐水溶液的钯催化剂施加溶液和使用相同方法进行铜布线板化学镀镍的方法

摘要

PROBLEM TO BE SOLVED: To provide a means for obtaining an ultrafine metal wiring film substrate which is free from short circuit between metal wiring and deposition of nickel in a wiring space part, and in which a copper wiring surface is uniformly covered with nickel, even in a polyimide film substrate having an ultrafine copper wiring circuit wherein the wiring width (L) and the wiring interval (S) are each 15 μm or less.;SOLUTION: After subjecting a polyimide film substrate having a fine copper wiring circuit to degreasing and acid cleaning, the resulting polyimide film substrate is immersed into a palladium ammine complex salt aqueous solution containing ammonium ions in an excess amount to palladium ions (divalent) for a certain time to substitute the surface of the copper wiring with palladium. Thereafter, the resulting substrate is subjected to acid cleaning and pure water shower cleaning to remove the complex salt aqueous solution adhering in excess, and plating is performed by using a commercially available electroless nickel plating solution.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种获得超细金属布线膜基板的方法,该金属布线膜基板不会在金属布线之间发生短路并且在布线空间部分中不会沉积镍,并且其中铜布线表面均匀地被镍覆盖。在具有超细铜布线电路的聚酰亚胺膜基板中,其中布线宽度(L)和布线间隔(S)分别为15μm或更小;解决方案:对具有精细铜布线电路的聚酰亚胺膜基板进行脱脂和酸洗后,将所得的聚酰亚胺膜基材浸入含有比钯离子(二价)过量的铵离子的钯胺络合物盐水溶液中一定时间,以用钯代替铜配线的表面。之后,对所得基材进行酸清洗和纯水喷淋清洗,以除去过量粘附的复合盐水溶液,并使用市售的化学镀镍溶液进行镀覆。版权所有:(C)2013,JPO&INPIT

著录项

  • 公开/公告号JP5808042B2

    专利类型

  • 公开/公告日2015-11-10

    原文格式PDF

  • 申请/专利权人 東レエンジニアリング株式会社;

    申请/专利号JP20110155924

  • 发明设计人 金子 美晴;小山 稔;

    申请日2011-07-14

  • 分类号C23C18/18;C23C18/34;H05K3/18;H05K3/26;

  • 国家 JP

  • 入库时间 2022-08-21 15:29:35

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