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Application of vapor-deposited carbon and zinc as a substitute for palladium catalyst in the electroless plating of nickel

机译:气相沉积碳和锌替代钯催化剂在化学镀镍中的应用

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A new electroless nickel plating technique is described which eliminates the conventional use of palladium catalyst. Using a physical vapor deposition technique, layers of carbon and of zinc of approximately 10 and 20 nm thickness, respectively, were deposited onto an ABS resin substrate on which had previously been adsorbed a colloidal mixed hydroxide containing nickel ions and copper ions. The electrons released by the oxidative dissolution of the zinc layer into the plating solution were utilized to reduce the colloids to metallic nickel and copper, which served as an anchor for the subsequently plated nickel films. The peeling strengths of the electroless nickel films resulting from the application of this technique were in the order of 200 kg/m, in contrast to values of approximately 220 kg/m obtained using a conventional tin (2 +) sensitizer and palladium (2 +) activator. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 6]
机译:描述了一种新的化学镀镍技术,该技术消除了钯催化剂的常规使用。使用物理气相沉积技术,分别将约10和20 nm厚的碳层和锌层沉积到ABS树脂基底上,该基底先前已吸附了包含镍离子和铜离子的胶体混合氢氧化物。通过将锌层氧化溶解到电镀液中释放的电子被用于将胶体还原为金属镍和铜,金属镍和铜充当随后镀镍膜的锚点。与使用常规锡(2+)敏化剂和钯(2+)获得的约220 kg / m的值相比,应用该技术所获得的化学镀镍膜的剥离强度约为200 kg / m。 )激活剂。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:6]

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