Method and arrangement for the in-situ process monitoring and control for the plasma processing tool

摘要

Configuration for implementing an automatic in-situ process control system during execution of the [SOLUTION] recipe is provided. Includes a control loop sensor configured at least to collect a set of sensor data to the first in order to facilitate the monitoring of the set point in the execution of the recipe, the control loop these sensors, the configuration, the process control loop I'm a part of. The configuration also includes a set of independent sensors does not make it is configured at least to collect a set of sensor data, a second part of the process control loop. Further still, the configuration includes a hub that is configured to at least receive the at least one set of sensor data and the second set of sensor data to the first. In addition, the configuration includes an analysis computer is coupled to communicatively formula hub and configured to perform the analysis of at least one of the sets of sensor data and the second set of sensor data to the first still . [Selection Figure Figure 2