首页> 外国专利> Fe-Co-Ni -based alloy sputtering target material .

Fe-Co-Ni -based alloy sputtering target material .

机译:Fe-Co-Ni基合金溅射靶材。

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target material of an Fe-Co-Ni-based alloy having low magnetic permeability, which can improve the efficiency of use in the magnetron sputtering, and can increase the plate thickness of the target.;SOLUTION: The sputtering target material of the Fe-Co-Ni-based alloy is formed of a sintered body having such a composition ratio as to satisfy Fe:Ni=90:10 to 65:35 and (Fe+Ni):Co=90:10 to 10:90 by atom ratio, and includes crystal phases containing 35 atom% or less Ni, 15 atom% or less Co and mainly Fe in the structure of the sintered target material, in which the ratio Ifcc(200)/Ibcc(200) of X-ray diffraction peak intensity (Ifcc(200)) obtained from the (200) face of the fcc phase containing mainly Fe of the crystal phases containing mainly Fe, to X-ray diffraction peak intensity (Ibcc(200)) obtained from the (200) face of the bcc phase containing mainly Fe is 10 or more.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供具有低磁导率的Fe-Co-Ni基合金的溅射靶材料,其可以提高磁控溅射的使用效率,并且可以增加靶的板厚。 :Fe-Co-Ni基合金的溅射靶材料由具有满足Fe∶Ni = 90∶10至65∶35和(Fe + Ni)∶Co = 90的组成比的烧结体形成。在烧结靶材料的结构中按原子比计为:10至10:90,并且包括在烧结靶材料的结构中包含35原子%或更少的Ni,15原子%或更少的Co和主要为Fe的晶相,从主要包含Fe的晶相的主要包含Fe的fcc相的(200)面获得的X射线衍射峰强度(Iccc(200))(200)。 )从主要含Fe的bcc相的(200)面获得10或更多。;版权所有:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP5656104B2

    专利类型

  • 公开/公告日2015-01-21

    原文格式PDF

  • 申请/专利权人 日立金属株式会社;

    申请/专利号JP20100149009

  • 发明设计人 上野 友典;福岡 淳;

    申请日2010-06-30

  • 分类号C23C14/34;C22C19/07;C22C38/00;G11B5/851;

  • 国家 JP

  • 入库时间 2022-08-21 15:28:37

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