首页> 外国专利> SUSCEPTOR PROCESSING METHOD AND SUSCEPTOR PROCESSING PLATE

SUSCEPTOR PROCESSING METHOD AND SUSCEPTOR PROCESSING PLATE

机译:承接方处理方法和承接方处理板

摘要

A susceptor processing method according to an embodiment includes: placing a plate on a susceptor arranged in a film forming chamber; heating the susceptor in order to have a temperature higher than that of the plate by using a main heater arranged below the susceptor and an auxiliary heater arranged in an upper part of the film forming chamber, and subliming a SIC film having been formed on a surface of the susceptor and adhering the sublimed SIC on the plate; and transporting the plate from the film forming chamber, the plate having SIC adhered thereon.
机译:根据实施方式的基座处理方法包括:将板放置在布置在成膜室中的基座上;以及将板放置在成膜室中。通过使用布置在基座下方的主加热器和布置在成膜室上部的辅助加热器来加热基座以使其温度高于板的温度,并升华表面上已形成的SIC膜基座,并将升华的SIC粘附在板上;并从成膜室输送板,该板上附着有SIC。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号