首页> 外国专利> COMPOSITION FOR FORMING SILVER ION DIFFUSION-SUPPRESSING LAYER, FILM FOR SILVER ION DIFFUSION-SUPPRESSING LAYER, CIRCUIT BOARD, ELECTRONIC DEVICE, CONDUCTIVE FILM LAMINATE, AND TOUCH PANEL

COMPOSITION FOR FORMING SILVER ION DIFFUSION-SUPPRESSING LAYER, FILM FOR SILVER ION DIFFUSION-SUPPRESSING LAYER, CIRCUIT BOARD, ELECTRONIC DEVICE, CONDUCTIVE FILM LAMINATE, AND TOUCH PANEL

机译:用于形成银离子扩散抑制层的成分,用于银离子扩散抑制层的膜,电路板,电子设备,导电膜叠层和触摸面板

摘要

A composition for forming a silver ion diffusion-suppressing layer includes an insulating resin and a compound including: a structure selected from the group consisting of a triazole structure, a thiadiazole structure and a benzimidazole structure; a mercapto group; and at least one hydrocarbon group optionally containing a heteroatom, with the total number of carbon atoms in the hydrocarbon group or groups being 5 or more. The composition for forming a silver ion diffusion-suppressing layer allows formation of a silver ion diffusion-suppressing layer capable of suppressing silver ion migration between metal interconnects containing silver or a silver alloy to improve the reliability on the insulation between the metal interconnects.
机译:用于形成银离子扩散抑制层的组合物包括绝缘树脂和化合物,该化合物包括:三唑结构,噻二唑结构和苯并咪唑结构;巯基至少一个含有杂原子的烃基,该烃基中的碳原子总数为5以上。用于形成银离子扩散抑制层的组合物允许形成银离子扩散抑制层,该层能够抑制含银的金属互连或银合金之间的银离子迁移,从而提高金属互连之间的绝缘可靠性。

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