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Methods and systems of object based metrology for advanced wafer surface nanotopography
Methods and systems of object based metrology for advanced wafer surface nanotopography
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机译:用于先进晶圆表面纳米形貌的基于对象的度量方法和系统
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摘要
A system and method for enhanced and expanded localized geometry characterization. Objects of interest are enhanced, detected, and classified according to user-defined parameters, and this enables enhanced contrast and more accurate feature detection, as well as more accurately defined feature object regions for feature geometry measurement and characterization.
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