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Multifunctional substrate polishing and burnishing device and polishing and burnishing method thereof

机译:多功能基板抛光抛光装置及其抛光抛光方法

摘要

A substrate grinding and polishing device comprising separate grinding and polishing units for operating on a work-piece. The work piece is clamped to a rotating work table under the units and a track underneath the rotating work table allows for quick transfer from the grinding unit to the polishing unit or vice versa. This setup allows for easy transfer as well as quick adjustment between different modes of grinding and polishing.
机译:基板研磨和抛光装置,包括用于在工件上操作的单独的研磨和抛光单元。工件被夹紧在单元下方的旋转工作台上,旋转工作台下方的轨道可将其从磨削单元快速转移到抛光单元,反之亦然。此设置可轻松进行转移,并可以在不同的研磨和抛光模式之间进行快速调整。

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