首页> 外国专利> Semiconductor device and method of forming vertically offset conductive pillars over first substrate aligned to vertically offset BOT interconnect sites formed over second substrate

Semiconductor device and method of forming vertically offset conductive pillars over first substrate aligned to vertically offset BOT interconnect sites formed over second substrate

机译:半导体器件和在第一衬底上形成垂直偏移的导电柱的方法,该方法对准在第二衬底上方形成的垂直偏移的BOT互连部位

摘要

A semiconductor device has a first substrate and first conductive pillars formed over the first substrate. Second conductive pillars are formed over the first substrate alternating with the first conductive pillars. The second conductive pillars are vertically offset with respect to the first conductive pillars. First BOT interconnect sites are formed over a second substrate. Second BOT interconnect sites are formed over the second substrate alternating with the first interconnect sites. The second interconnect sites are vertically offset with respect to the first interconnect sites. The first substrate is mounted to the second substrate such that the first conductive pillars are aligned with and electrically connected to the first interconnect sites and the second conductive pillars are aligned with and electrically connected to the second interconnect sites. An underfill material is deposited between the first and second substrates. The first substrate can be a flipchip type semiconductor device.
机译:半导体器件具有第一基板和形成在第一基板上方的第一导电柱。第二导电柱与第一导电柱交替形成在第一基板上方。第二导电柱相对于第一导电柱垂直地偏移。在第二基板上方形成第一BOT互连位点。第二BOT互连部位与第一互连部位交替形成在第二基板上方。第二互连位置相对于第一互连位置垂直偏移。将第一基板安装到第二基板,使得第一导电柱与第一互连部位对准并电连接,并且第二导电柱与第二互连部位对准并电连接。底部填充材料沉积在第一和第二基板之间。第一衬底可以是倒装芯片型半导体器件。

著录项

  • 公开/公告号US8896133B2

    专利类型

  • 公开/公告日2014-11-25

    原文格式PDF

  • 申请/专利权人 STATS CHIPPAC LTD.;

    申请/专利号US201313870928

  • 申请日2013-04-25

  • 分类号H01L23/48;H01L21/48;H01L23/00;H01L23/498;H01L21/56;

  • 国家 US

  • 入库时间 2022-08-21 15:17:42

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