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Methods and systems for selectively forming metal layers on lead frames after die attachment
Methods and systems for selectively forming metal layers on lead frames after die attachment
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机译:在芯片附着后在引线框架上选择性地形成金属层的方法和系统
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摘要
Methods and systems are disclosed for selectively forming metal layers on lead frames after die attachment to improve electrical connections for areas of interest on lead frames, such as for example, lead fingers and down-bond areas. By selectively forming metal layers on areas of interest after die attachment, the disclosed embodiments help to eliminate anomalies and associated defects for the lead frames that may be caused by the die attachment process. A variety of techniques can be utilized for selectively forming one or more metal layers, and a variety of metal materials can be used (e.g., nickel, palladium, gold, silver, etc.). Further, cleaning can also be performed with respect to the areas of interest prior to selectively forming the one or more metal layers on areas of interest for the leaf frame.
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