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Cut mask aware contact enclosure rule for grating and cut patterning solution
Cut mask aware contact enclosure rule for grating and cut patterning solution
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机译:切割掩模感知的接触外壳规则,用于光栅和切割图案解决方案
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摘要
Methodologies and an apparatus enabling a selection of design rules to improve a density of features of an IC design are disclosed. Embodiments include: determining a feature overlapping a grating pattern of an IC design, the grating pattern including a plurality of grating structures; determining a shape of a cut pattern overlapping the grating pattern; and selecting one of a plurality of rules for the feature based on the determined shape.
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