首页> 外国专利> Photoelectric conversion film-stacked solid-state imaging device without microlenses, its manufacturing method, and imaging apparatus

Photoelectric conversion film-stacked solid-state imaging device without microlenses, its manufacturing method, and imaging apparatus

机译:无微透镜的光电转换膜堆叠式固态成像装置,其制造方法和成像装置

摘要

There are provided a semiconductor substrate; a photoelectric conversion film stacked on a layer that is disposed on the light incidence side of the semiconductor substrate; signal reading unit formed in a surface portion of the semiconductor substrate, for reading out, as shot image signals, signals corresponding to signal charge amounts detected by the photoelectric conversion film according to incident light quantities; a transparent substrate bonded to a layer that is disposed on the light incidence side of the photoelectric conversion film with a transparent resin as an adhesive; and electric connection terminals which are connected to the signal reading unit by interconnections and which penetrate through the semiconductor substrate and are exposed in a surface, located on the opposite side to the side where the photoelectric conversion film is provided, of the semiconductor substrate.
机译:提供一种半导体衬底;光电转换膜堆叠在布置在半导体基板的光入射侧上的层上;信号读取单元,形成在半导体基板的表面部分中,用于将与光电转换膜根据入射光量检测到的信号电荷量相对应的信号作为拍摄图像信号读出;透明基板,其通过透明树脂作为粘接剂而粘接在配置于光电转换膜的光入射侧的层上。电连接端子通过互连连接到信号读取单元,并且电连接端子穿过半导体基板并且暴露在半导体基板的与设置有光电转换膜的一侧相对的一侧的表面中。

著录项

  • 公开/公告号US8970749B2

    专利类型

  • 公开/公告日2015-03-03

    原文格式PDF

  • 申请/专利权人 HIROSHI INOMATA;EIJI WATANABE;

    申请/专利号US201113049837

  • 发明设计人 HIROSHI INOMATA;EIJI WATANABE;

    申请日2011-03-16

  • 分类号H04N5/335;H01L27/146;

  • 国家 US

  • 入库时间 2022-08-21 15:17:32

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