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Copper alloy for electronic/electric device, copper alloy thin plate for electronic/electric device, method of producing copper alloy for electronic/electric device, conductive component for electronic/electric device and terminal
Copper alloy for electronic/electric device, copper alloy thin plate for electronic/electric device, method of producing copper alloy for electronic/electric device, conductive component for electronic/electric device and terminal
What is provided is a copper alloy for electronic/electric device comprising: in mass %, more than 2% and 36.5% or less of Zn; 0.1% or more and 0.9% or less of Sn; 0.05% or more and less than 1.0% of Ni; 0.001% or more and less than 0.10% of Fe; 0.005% or more and 0.10% or less of P; and the balance Cu and inevitable impurities, wherein a content ratio of Fe to Ni, Fe/Ni satisfies 0.002≦Fe/Ni1.5, a content ratio of a sum of Ni and Fe, (Ni+Fe), to P satisfies 3(Ni+Fe)/P15, a content ratio of Sn to a sum of Ni and Fe, (Ni+Fe) satisfies 0.3Sn/(Ni+Fe)5, an average crystal grain diameter of α phase containing Cu, Zn, and Sn is in a range of 0.1 to 50 μm, and the copper alloy includes a precipitate containing P and one or more elements selected from Fe and Ni.
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机译:提供了一种用于电子/电气设备的铜合金,其包含:以质量%计,大于2%且36.5%以下的Zn;和Sn:0.1%以上0.9%以下; Ni的0.05%以上且小于1.0%; 0.001%以上且小于0.10%的Fe; P的0.005%以上且0.10%以下; Fe和Ni,Fe / Ni的含量比满足0.002≤Fe/ Ni <1.5,Ni和Fe之和(Ni + Fe)与P的含量比满足3的余量的Cu和不可避免的杂质。 <(Ni + Fe)/ P <15,Sn与Ni和Fe之和的含量比,(Ni + Fe)满足0.3 展开▼