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SAMPLE HOLDER AND FOCUSED-ION-BEAM MACHINING DEVICE PROVIDED THEREWITH

机译:由此提供的样品夹和聚焦离子束加工装置

摘要

In order to implement a focused-ion-beam machining device that is capable of machining thin samples that are large in surface area and uniform in thickness or needle-like samples having sharp tips, in this focused-ion-beam machining device, which is provided with an ion source (1), an electron lens (3) that focuses an ion beam (2) from said ion source (1) onto a sample (5), and a sample holder (13) that holds said sample (5), said sample holder (13) is provided with a shielding electrode (7), said shielding electrode (7) being laid out so as to cover the sample (5) and also being insulated therefrom such that voltages can be applied to the sample (5) and the shielding electrode (7) separately.
机译:为了实现能够加工表面积大且厚度均匀的薄样品或尖端尖的针状样品的聚焦离子束加工装置,该聚焦离子束加工装置为:设有离子源(1),将来自所述离子源(1)的离子束(2)聚焦到样品(5)上的电子透镜(3)和保持所述样品(5)的样品架(13)。 ),所述样品保持器(13)设置有屏蔽电极(7),所述屏蔽电极(7)被布置为覆盖样品(5)并且还与之绝缘以使得可以将电压施加到样品上(5)和屏蔽电极(7)分开。

著录项

  • 公开/公告号WO2014184881A1

    专利类型

  • 公开/公告日2014-11-20

    原文格式PDF

  • 申请/专利权人 HITACHI LTD.;

    申请/专利号WO2013JP63458

  • 申请日2013-05-14

  • 分类号H01J37/317;

  • 国家 WO

  • 入库时间 2022-08-21 15:10:07

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