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SAMPLE HOLDER AND FOCUSED-ION-BEAM MACHINING DEVICE PROVIDED THEREWITH

机译:由此提供的样品夹和聚焦离子束加工装置

摘要

To realize a focused-ion-beam machining apparatus capable of machining a thin sample with a wide area and a uniform film thickness and a needle-like sample with a sharp tip, in a focused-ion-beam machining apparatus including: an ion source (1); an electronic lens (3) focusing an ion beam extracted from the ion source (1) and irradiating the ion beam to a sample (5); and a sample holder (13) holding the sample (5), the sample holder (13) is provided with a shield electrode (7) arranged in a manner such as to cover the sample (5), and the sample (5) and the shield electrode (7) are insulated from each other in a manner such that voltages can be applied to them separately from each other.
机译:为了实现一种聚焦离子束加工装置,该聚焦离子束加工装置在包括以下离子源的聚焦离子束加工装置中,能够加工具有大面积且均匀的膜厚的薄样品和具有尖锐的尖端的针状样品。 ( 1 );电子透镜( 3 )聚焦从离子源( 1 )提取的离子束并将离子束照射到样品( 5 ) ;并在保持样品( 5 )的样品架( 13 )上,在样品架( 13 )上设置屏蔽电极( 7 )以覆盖样品( 5 ),样品( 5 )和屏蔽电极( 7)的方式排列)彼此绝缘,以使电压可以彼此分开施加。

著录项

  • 公开/公告号US2016172158A1

    专利类型

  • 公开/公告日2016-06-16

    原文格式PDF

  • 申请/专利权人 HITACHI LTD.;

    申请/专利号US201314890258

  • 申请日2013-05-14

  • 分类号H01J37/305;

  • 国家 US

  • 入库时间 2022-08-21 14:37:48

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