首页> 外国专利> ANALYSIS OF THE COMPOSITION OF A GAS OR A GAS FLOW IN A CHEMICAL REACTOR AND METHOD FOR PRODUCING CHLOROSILANES IN A FLUIDIZED BED REACTOR

ANALYSIS OF THE COMPOSITION OF A GAS OR A GAS FLOW IN A CHEMICAL REACTOR AND METHOD FOR PRODUCING CHLOROSILANES IN A FLUIDIZED BED REACTOR

机译:化学反应器中一种或多种气体的组成分析及流化床反应器中生产氯硅烷的方法

摘要

The invention relates to a method for analyzing the composition of a gas or a gas flow, containing AlCl3, in a chemical reactor, comprising removing AlCl3 from the gas and then examining the gas by means of gas chromatography or spectroscopy. The invention also relates to a method for producing chlorosilanes in a fluidized bed reactor having a reactor height H0, wherein fed HCl is reacted with silicon, characterized in that a temperature profile in the fluidized bed reactor is greater than S1(H/H0) = (a1–b1)*(1/(1+exp(–c1((H/H0)–d1))))+b1 and less than S2(H/H0) = (a2–b2)*(1/(1+exp(–c2((H/H0)–d2))))+b2, wherein a1 = 100 °C, a2 = 300 °C, b1 = 300 °C, b2 = 400 °C, c1 = 50, c2 = 20, d1 = 0.2, and d2 = 0.8.
机译:本发明涉及一种用于在化学反应器中分析包含AlCl 3的气体或气流的组成的方法,该方法包括从气体中去除AlCl 3,然后通过气相色谱法或光谱法检查该气体。本发明还涉及在具有反应器高度H0的流化床反应器中生产氯硅烷的方法,其中进料的HCl与硅反应,其特征在于流化床反应器中的温度分布大于S1(H / H0)= (a1-b1)*(1 /(1 + exp(-c1((H / H0)-d1))))+ b1且小于S2(H / H0)=(a2-b2)*(1 /( 1 + exp(–c2(((H / H0)–d2))))+ b2,其中a1 = 100°C,a2 = 300°C,b1 = 300°C,b2 = 400°C,c1 = 50, c2 = 20,d1 = 0.2,d2 = 0.8。

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