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METHOD FOR REDUCING GROWTH OF NON-UNIFORMITIES AND AUTODOPING DURING COLUMN III-V GROWTH INTO DIELECTRIC WINDOWS
METHOD FOR REDUCING GROWTH OF NON-UNIFORMITIES AND AUTODOPING DURING COLUMN III-V GROWTH INTO DIELECTRIC WINDOWS
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机译:减小不均匀性增长并在列III-V增长到介电窗口期间自动掺杂的方法
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摘要
A method for depositing a column III-V material over a selected portion of a substrate through a window formed in a dielectric layer disposed over the selected portion of the substrate. The method includes forming a single crystal layer or polycrystalline layer over a field region of the dielectric layer adjacent to the window; and, growing, by MOCVD, a column III-V material over the single crystal layer or polycrystalline layer and through the window over the selected portion of the substrate.
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