TRANSPARENT CONDUCTOR MANUFACTURING METHOD AND TRANSPARENT CONDUCTOR MANUFACTURING APPARATUS
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机译:透明导体制造方法及透明导体制造装置
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摘要
The present invention addresses the problem of providing a manufacturing method capable of manufacturing high function transparent conductors by forming a thin silver-containing transparent metal layer on continuously conveyed transparent substrates without reducing function. Said transparent conductor manufacturing method is a method for manufacturing transparent conductors, which are formed by successively laminating at least a first high refractive index layer, a silver-containing transparent metal layer, and a second high refractive index layer on continuously conveyed transparent substrates (1) and in which ratio of the thickness of the first high refractive index layer to the transparent metal layer and the ratio of the thickness of the second high refractive index layer to the transparent metal layer are both 3 or more. The manufacturing method is characterized in comprising multiple film-forming steps for forming films on the transparent substrates (1) and in forming the transparent metal layer by making the static film formation rate for the transparent metal layer to be 18 nm/min or more in the film-forming step for forming the transparent metal layer among the multiple film-forming steps.
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