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TRANSPARENT CONDUCTOR MANUFACTURING METHOD AND TRANSPARENT CONDUCTOR MANUFACTURING APPARATUS

机译:透明导体制造方法及透明导体制造装置

摘要

The present invention addresses the problem of providing a manufacturing method capable of manufacturing high function transparent conductors by forming a thin silver-containing transparent metal layer on continuously conveyed transparent substrates without reducing function. Said transparent conductor manufacturing method is a method for manufacturing transparent conductors, which are formed by successively laminating at least a first high refractive index layer, a silver-containing transparent metal layer, and a second high refractive index layer on continuously conveyed transparent substrates (1) and in which ratio of the thickness of the first high refractive index layer to the transparent metal layer and the ratio of the thickness of the second high refractive index layer to the transparent metal layer are both 3 or more. The manufacturing method is characterized in comprising multiple film-forming steps for forming films on the transparent substrates (1) and in forming the transparent metal layer by making the static film formation rate for the transparent metal layer to be 18 nm/min or more in the film-forming step for forming the transparent metal layer among the multiple film-forming steps.
机译:本发明解决了提供能够通过在连续传送的透明基板上形成薄的含银透明金属层而不降低功能的情况下制造高功能透明导体的制造方法的问题。所述透明导体制造方法是用于制造透明导体的方法,该透明导体通过在连续输送的透明基板上依次层叠至少第一高折射率层,含银的透明金属层和第二高折射率层而形成(1 ),其中第一高折射率层与透明金属层的厚度之比和第二高折射率层与透明金属层的厚度之比均为3以上。该制造方法的特征在于,包括多个成膜步骤,以在透明基板(1)上成膜,并且通过使透明金属层的静态成膜速度为18nm / min以上,形成透明金属层。在多个成膜步骤中,用于形成透明金属层的成膜步骤。

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