Wavefront measurement method, shape measurement method, optical element manufacturing method, optical apparatus manufacturing method, program, and wavefront measurement apparatus

摘要

A wavefront measurement method includes the steps of causing object light to be incident on a Shack-Hartmann sensor (101), capturing a first spot image under an image pickup condition (A), calculating data of first spot positions (I) that correspond to the first spot image, calculating second spot positions (I') by simulating a second spot image on the basis of the image pickup condition (A) and information of a travelling direction of diffracted light generated when the object light passes through the microlenses, and reducing detection errors of the spot positions by correcting the data of the first spot positions (I) on the basis of data of the second spot positions (I') including data of a detection error due to the diffracted light.