首页> 外国专利> COMPOSITION FOR FORMING SILICA BASED LAYER, SILICA BASED LAYER AND METHOD FOR MANUFACTURING SILICA BASED LAYER

COMPOSITION FOR FORMING SILICA BASED LAYER, SILICA BASED LAYER AND METHOD FOR MANUFACTURING SILICA BASED LAYER

机译:形成二氧化硅基层的组合物,二氧化硅基层和制造二氧化硅基层的方法

摘要

The present invention relates to a composition for forming a silica-based film, comprising: a silicon-containing polymer having the weight-average molecular weight of 20,000 to 160,000; and a solvent, to the silica-based film obtained by using the same, and to a method for manufacturing the silica-based film.
机译:本发明涉及一种用于形成二氧化硅基膜的组合物,其包含:重均分子量为20,000至160,000的含硅聚合物;和本发明的二氧化硅基膜及其制造方法涉及一种溶剂和溶剂。

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