首页>
外国专利>
COMPOSITION FOR FORMING SILICA BASED LAYER, SILICA BASED LAYER AND METHOD FOR MANUFACTURING SILICA BASED LAYER
COMPOSITION FOR FORMING SILICA BASED LAYER, SILICA BASED LAYER AND METHOD FOR MANUFACTURING SILICA BASED LAYER
展开▼
机译:形成二氧化硅基层的组合物,二氧化硅基层和制造二氧化硅基层的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention relates to a composition for forming a silica-based film, comprising: a silicon-containing polymer having the weight-average molecular weight of 20,000 to 160,000; and a solvent, to the silica-based film obtained by using the same, and to a method for manufacturing the silica-based film.
展开▼