DEVICE CORRELATED METROLOGY (DCM) FOR OVL WITH EMBEDDED SEM STRUCTURE OVERLAY TARGETS

摘要

An aspect of the present disclosure describes a target for use in measuring the relative position between two substantially coplanar layers of a device. The target includes a periodic structure in the first and second layers. The difference in relative position of the first and second layers between the first and second periodic structures and the individual device-like structure can be measured to correct the relative position of the first and second layers between the first and second periodic structures . This summary emphasizes that the search engineer or other reader is provided to comply with the rules requiring summaries that enable them to quickly identify the subject of the technical disclosure. And this is to be construed as including that it will not be used to interpret or limit the scope or meaning of the claims.