SEM OVL DCMDEVICE CORRELATED METROLOGY DCM FOR OVL WITH EMBEDDED SEM STRUCTURE OVERLAY TARGETS

摘要

Aspects of the present disclosure describe a target for use in measuring the relative position between two substantially coplanar layers of a device. The target includes periodic structures in the first and second layers. The difference in the relative positions of the first and second layers between the first and second periodic structures and the individual device-type structures are measured to correct the relative positions of the first and second layers between the first and second periodic structures. . It is emphasized that this summary is provided to comply with the rules requiring a summary that allows search technicians or other readers to quickly identify the subject of a technical disclosure. It is stated, including that it will not be used to interpret or limit the scope or meaning of the claims.