Overlay, SEM, and CD control topics find favor at symposium's metrology and inspection conference

摘要

An array of technical presentations on pattern overlay and SEM technology will share the spotlight in the metrology conference portion of SPIE's microlithography symposium this month. Additional metrology highlights include a session devoted to new technologies and one exploring the microeconomics of 300-mm manufacturing. A panel discussion on the topic will follow, which is a first. Hosted by SPIE, the 26th Annual International Symposium on Microlithography will be held February 25-March 2 in Santa Clara, CA.