首页> 外国专利> Tunneling diode, tunneling transistor, tunneling photodiode, and tunneling phototransistor with the structure of graphene-insulator-semiconductor

Tunneling diode, tunneling transistor, tunneling photodiode, and tunneling phototransistor with the structure of graphene-insulator-semiconductor

机译:具有石墨烯-绝缘体-半导体结构的隧穿二极管,隧穿晶体管,隧穿光电二极管和隧穿光电晶体管

摘要

A tunneling diode with a graphene-insulator-semiconductor structure according to the present invention includes a graphene layer, a non conductive layer which is stacked on the lower side of the graphene layer, a semiconductor layer which is stacked on the lower side of the non conductive layer, a first electrode which is formed on the graphene layer, and a second electrode which is formed on the semiconductor layer.
机译:根据本发明的具有石墨烯-绝缘体-半导体结构的隧道二极管包括石墨烯层,堆叠在石墨烯层的下侧的非导电层,堆叠在非石墨烯层的下侧的半导体层。导电层,形成在石墨烯层上的第一电极和形成在半导体层上的第二电极。

著录项

  • 公开/公告号KR101479395B1

    专利类型

  • 公开/公告日2015-01-05

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20130024860

  • 发明设计人 최재우;박홍기;

    申请日2013-03-08

  • 分类号H01L29/772;H01L29/861;

  • 国家 KR

  • 入库时间 2022-08-21 14:58:54

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