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RC CORNER SOLUTIONS FOR DOUBLE PATTERNING TECHNOLOGY
RC CORNER SOLUTIONS FOR DOUBLE PATTERNING TECHNOLOGY
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机译:RC弯角双拼技术解决方案
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摘要
A method includes determining model parameters for forming an integrated circuit, and generating a techfile using the model parameters. The techfile includes at least two of a C_worst table, a C_best table, and a C_nominal table. The C_worst table stores greatest parasitic capacitances between layout patterns of the integrated circuit when lithography masks comprising the layout patterns shift relative to each other. The C_best table stores smallest parasitic capacitances between the layout patterns when the lithography masks shift relative to each other. The C_nominal table stores nominal parasitic capacitances between the layout patterns when the lithography masks do not shift relative to each other. The techfile is embodied on a tangible non-transitory storage medium.
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