METHOD OF MANUFACTURING SUBSTRATE SET FOR MASKBLANK, METHOD OF MANUFACTURING MASKBLANK SET, METHOD OF MANUFACTURING PHOTOMASK SET, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

The substrate set is a substrate set for a mask blank in which a plurality of sets of substrates used as a mask blank for manufacturing a photomask chucked to a mask stage of an exposure apparatus. The substrate used as a plurality of sets is a convex shape in which the shape of the main surface on the side where the thin film forming the transfer pattern is provided is relatively high at the center and relatively low at the periphery. In each of the substrates, the flatness in a 142 mm square area including the central part of the main surface is 0.3 m or less, and the difference when fitting to the reference main surface of the reference substrate is 40 nm or less.