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Dielectric Barrier Discharge Reactor for making Disilane, Trisilane and Tetrasilane from Silane

机译:介电阻挡放电反应器,用于从硅烷制备乙硅烷,丙硅烷和四硅烷

摘要

invention disilane and trisilane and tetrasilane of producing a dielectric barrier for It relates to a discharge reaction device, and more particularly, di-silane in silane as well as trisilane, tetrasilane in a reaction device which can be manufactured in a continuous process, the reactor interior and a discharge electrode that is connected to the high-frequency devices, this external The configuration around the inside of the porous tubes, the material of the discharge electrode, by adjusting the distance of the discharge electrode and the porous tubes, silane from disilane, trisilane, tetrasilane disilane the continuous production of a high yield, while having a possible is related to the dielectric barrier discharge reactor for the production of tetra-and trisilane and silane. ;
机译:生产介电阻挡层的乙硅烷和三硅烷及四硅烷的发明涉及一种放电反应装置,更具体地说,涉及一种硅烷中的乙硅烷以及可连续制造的反应装置中的三硅烷,四硅烷,反应器内部和连接到高频设备的放电电极,该外部围绕多孔管内部的构造,即放电电极的材料,通过调节放电电极和多孔管的距离,硅烷与乙硅烷之间的距离,三硅烷,四硅烷,乙硅烷的连续生产高产率,同时可能与介电势垒放电反应器有关,用于生产四硅烷和三硅烷和硅烷。 ;

著录项

  • 公开/公告号KR101538388B1

    专利类型

  • 公开/公告日2015-07-22

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20130066750

  • 发明设计人 유이치 이이쿠보;장향자;

    申请日2013-06-11

  • 分类号C01B33/021;B01J19/12;C01B33/04;

  • 国家 KR

  • 入库时间 2022-08-21 14:57:53

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