METHOD FOR FABRICATING CONE-SHAPE NANOSTRUCTURES USING PLASMA ETCHING AND THE CONE-SHAPE NANOSTRUCTURES

摘要

The present invention relates to a method for fabricating cone-shaped nanostructures using plasma etching and cone-shaped nanostructures thereof. The method for fabricating cone-shaped nanostructures using plasma etching comprises the steps of: forming a mask layer having a hole pattern on an etching layer; forming a provision layer of a fluorocarbon film at a wall surface of the hole and an upper surface of the mask layer; and performing an etching process on the etching layer through a plasma etching process. The provision layer is composed of substances sputtered by the plasma etching process.