METHOD AND DEVICE FOR LASER INITIATION OF LOCAL precipitated product dissociation of gas discharge plasma

摘要

Apparatus for coating a gas phase plasma chemical deposition of compounds of various elements on the glass-ceramic materials comprising a plasma chemical reactor with a system of electrodes, high frequency discharge excitation system, the equilibrium of substrate heating system, a system of vacuum pumping, gas supply system, a system of coating and an additional feed unit automatic control deposition process constant component on the electrode system with adjustable magnitude and polarity of the supplied n apryazheniya, characterized in that, in order to implement a local method of depositing the products of dissociation of the gas-discharge plasma, a system of equilibrium heating the substrate is replaced by a system of nonequilibrium heating of focused laser radiation is only one part of the ceramic substrate, which is necessary to make a local deposition, for which the device for implementing the method further is provided with a laser light source, controlled by a controller or PC scanning system Focus uyuschim lens, wherein the vacuum chamber of the reactor is made with a window that allows to deliver a focused laser beam to the ceramic substrate, and one electrode of the electrode system made hollow to laser radiation can freely reach the substrate surface.