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CLARIFYING THIN-FILM COATING BASED ON SILICON(IV) AND BISMUTH(III) OXIDE COMPOUNDS

机译:澄清基于硅(IV)和氧化铋(III)化合物的薄膜涂层

摘要

FIELD: chemistry.;SUBSTANCE: invention relates to antireflection thin-film oxide coatings based on SiO2, applied on transparent glass for miniature incandescent lamps. The antireflection thin-film coating based on silicon(IV) and bismuth(III) oxide compounds contains a film-forming solution based on ethyl alcohol, tetraethoxysilane in the presence of a sulphuric acid additive. Into the composition of the solution additionally added is an electrolyte - stabiliser being crystalline hydrate of bismuth (III) nitrate with the following component ratio, wt %: tetraethoxysilane - 0.59-6.77; crystalline hydrate of bismuth (III) nitrate - 3.50-24.89; sulphuric acid - 0.01-0.02; ethyl alcohol - the remaining part.;EFFECT: increase of the service term of the film-forming solution.;1 dwg, 3 ex
机译:发明领域本发明涉及基于SiO 2 的减反射薄膜氧化物涂层,其应用于微型白炽灯的透明玻璃上。基于氧化硅(IV)和氧化铋(III)的减反射薄膜涂层包含在硫酸添加剂存在下的基于乙醇,四乙氧基硅烷的成膜溶液。在溶液的组合物中还添加了电解质-稳定剂,其为硝酸铋(III)的结晶水合物,具有以下组分比率,wt%:四乙氧基硅烷-0.59-6.77;和硝酸铋(III)的结晶水合物-3.50-24.89;硫酸-0.01-0.02;乙醇-剩余部分。效果:增加成膜溶液的使用期限。1dwg,3 ex

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