首页> 外国专利> CAPACITIVE MICRO- ELECTRO- MECHANICAL SENSORS WITH SINGLE CRYSTAL SILICON ELECTRODES

CAPACITIVE MICRO- ELECTRO- MECHANICAL SENSORS WITH SINGLE CRYSTAL SILICON ELECTRODES

机译:带有单晶硅电极的电容式微机电传感器

摘要

The devices presented herein are capacitive sensors with single crysta silicon on all key stress points. Isolating trenches are formed by trench and refill forning dielectrically isolated conductive silicon electrodes for drive, sense and guards, For pressure sensing devices according to the invention, the pressure port is opposed to the e ectrical wire bond pads for ease of packaging. Dual-axis accelerometers measuring in plane acceleration and out of plane acceleration are also described. A third axis in plane is i easy to achieve by duplicating and rotating the accelerometer 90 degrees about its out of plane axis Creating resonant structures, angular rate sensors, bolometers, and many other structures are possible with this process technology. Key advantages are hermeti ity, vertical vias, vertical and horizontal gap capability, single crystal materials, wafejr level packaging, small size, high performance and low cost.
机译:本文介绍的设备是在所有关键应力点上均具有单个晶体硅的电容式传感器。隔离沟槽是由沟槽和填充物形成的,形成用于驱动,传感和防护的绝缘绝缘的导电硅电极。对于根据本发明的压力传感装置,压力端口与电气引线焊盘相对,以便于包装。还描述了在平面加速度和平面加速度中测量的双轴加速度计。通过将加速计绕其平面外轴复制并旋转90度,可以轻松实现平面中的第三轴。使用此工艺技术,可以创建谐振结构,角速度传感器,辐射热计和许多其他结构。关键优势是:密封性,垂直通孔,垂直和水平间隙能力,单晶材料,晶圆级封装,小尺寸,高性能和低成本。

著录项

  • 公开/公告号EP2011132B1

    专利类型

  • 公开/公告日2016-06-29

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO LTD;

    申请/专利号EP20070755013

  • 发明设计人 BRYZEK JANUSZ;RAY CURTIS A.;

    申请日2007-04-04

  • 分类号B81B3/00;G01L9/00;G01P15/125;

  • 国家 EP

  • 入库时间 2022-08-21 14:52:23

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