首页> 外国专利> PRECURSOR SOLUTION, LAYER CONTAINING SILICON CARBIDE, POWER SEMICONDUCTOR ELEMENT, AND METHOD FOR MANUFACTURING POWER SEMICONDUCTOR ELEMENT

PRECURSOR SOLUTION, LAYER CONTAINING SILICON CARBIDE, POWER SEMICONDUCTOR ELEMENT, AND METHOD FOR MANUFACTURING POWER SEMICONDUCTOR ELEMENT

机译:前体溶液,包含碳化硅的层,功率半导体元件以及制造功率半导体元件的方法

摘要

PROBLEM TO BE SOLVED: To provide a material for reducing contact resistance in a power semiconductor element, and also to provide a power semiconductor element capable of reducing the contact resistance.;SOLUTION: A power semiconductor element comprises an intermediate layer 10 including silicon carbide containing an n- or p-type dopant, silicon (Si), and carbon (C) between a contact layer 20 to which a metal wiring 30 is connected and an impurity region composed of an n- or p-type semiconductor region formed in a silicon carbide crystal.;SELECTED DRAWING: Figure 5;COPYRIGHT: (C)2016,JPO&INPIT
机译:解决的问题:提供一种用于减小功率半导体元件中的接触电阻的材料,并且还提供一种能够减小接触电阻的功率半导体元件。解决方案:功率半导体元件包括中间层10,该中间层10包含含有碳化硅的在连接有金属布线30的接触层20与由形成在金属层30中的n型或p型半导体区域构成的杂质区域之间的n型或p型掺杂剂,硅(Si)和碳(C)。碳化硅晶体;;选定的图纸:图5;版权:(C)2016,JPO&INPIT

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