SUBSTRATE PROCESSING DEVICE, GAS DISPERSION UNIT, AND PRODUCTION DEVICE AND PROGRAM OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To improve characteristics of a film formed on a substrate and to improve production throughput.;SOLUTION: A gas dispersion unit includes: a processing chamber for processing a substrate; a substrate platform on which the substrate is placed; a first supply region facing the substrate and in which a first dispersal hole for supplying first gas and a second dispersal hole for supplying second gas are provided; and a second supply region facing an outer circumference side face from the face on which the substrate on the platform is mounted, which supplies the second gas with a larger hole diameter than the second dispersal hole.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2016,JPO&INPIT