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HEAT TREATMENT APPARATUS, ABNORMALITY DETECTION METHOD IN HEAT TREATMENT AND COMPUTER READABLE STORAGE MEDIUM
HEAT TREATMENT APPARATUS, ABNORMALITY DETECTION METHOD IN HEAT TREATMENT AND COMPUTER READABLE STORAGE MEDIUM
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机译:热处理装置,热处理中的异常检测方法和计算机可读存储介质
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摘要
PROBLEM TO BE SOLVED: To detect abnormality in the heat treatment of a substrate accurately.;SOLUTION: A heat treatment apparatus performing heat treatment of a wafer has: a heat plate 132 for mounting and heating a wafer W; a plurality of wafer support members 170 arranged to project above the mounting surface 132a of the heat plate 132; a weight sensor 184 for detecting a load which changes as the mounting state of the wafer W supported by the wafer support members 170 changes; and a control section 300 for determining that the mounting state of the wafer supported by the wafer support members 170 is abnormal, when the load detected by the weight sensor 184 goes below a predetermined threshold.;SELECTED DRAWING: Figure 9;COPYRIGHT: (C)2017,JPO&INPIT
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