Heat treatment apparatus, abnormality detection method in heat treatment, readable computer storage medium

摘要

PROBLEM TO BE SOLVED: To detect abnormality in the heat treatment of a substrate accurately.SOLUTION: A heat treatment apparatus performing heat treatment of a wafer has: a heat plate 132 for mounting and heating a wafer W; a plurality of wafer support members 170 arranged to project above the mounting surface 132a of the heat plate 132; a weight sensor 184 for detecting a load which changes as the mounting state of the wafer W supported by the wafer support members 170 changes; and a control section 300 for determining that the mounting state of the wafer supported by the wafer support members 170 is abnormal, when the load detected by the weight sensor 184 goes below a predetermined threshold.SELECTED DRAWING: Figure 9