BISMUTH TELLURIDE THIN FILM PRODUCTION METHOD AND BISMUTH TELLURIDE THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing both p-type and n-type BiTethin films by a production process as common as possible.SOLUTION: A p-type and an n-type are manufactured separately, by adjusting the RF power applied at the time of sputtering, by using a single Bi2Te3 target, by magnetron sputtering. The conduction type of a bismuth telluride thin film is made p-type, by applying a high frequency sputtering power, where the composition of tellurium in the bismuth telluride thin film exceeds 50 atom%. It is not required to heat a substrate on which the BiTethin film is formed.SELECTED DRAWING: Figure 1